SiBrickScan
(SBS) is a dedicated at-line system for the FTIR quantification of
interstitial Oxygen in complete Silicon ingots, resulting in a
concentration profile along the longitudinal axis. Accessing this
information without sawing wafers or test samples is a major and cost
saving advantage.
Get Valuable Information to Check and Optimize Product Quality
Knowing
the Oxygen gradient of Si ingots enables important conclusions helping
e.g. to control and optimize the Silicon crystallization process or to
identify batches of bad raw material. Therefore SBS will help to save
costs by optimizing product quality and reducing the amount of defective
wafers. The random sampling of individual ingots does strongly reduce
sample preparation efforts and provides relevant information much
earlier.
Highest Sensitivity by State-of-the-Art FTIR Spectroscopy
Interstitial
Oxygen quantification by FTIR spectroscopy (ASTM/SEMI 1188) is a
well-known and important analysis method, but limited to thin Si samples
in the low mm range. SiBrickScan (SBS) overcomes this limitation and is
the first commercially available completely dedicated system to
determine the Oxygen gradient in complete ingots along their major axis
without the need of time-consuming and destructive thin sample
preparation. SBS makes smart use of a related infrared overtone
absorption band combined with reliable and state-of-the-art Bruker FTIR
technology.